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Title: trenchless technology full report
Page Link: trenchless technology full report -
Posted By: project report tiger
Created at: Sunday 07th of February 2010 09:37:30 PM
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TRENCHLESS TECHNOLOGY

INTROD
UCTION
TT techniques include methods of pipeline & utility installations with minimum amount

of surface excavation
TT techniques are mainly divided into two main areas: TRENCHLESS CONSTRUCTION

METHODS(TCM) and TRENCHLESS RENEWAL METHODS(TRM)

TCM includes all methods for new utility & pipeline installations
TRM includes all methods of renewing, rehabilitating, or renovating an existing old

or host pipeline or utility system
Trenchless construction and ren ....etc

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Title: trenchless technology full report
Page Link: trenchless technology full report -
Posted By: project report tiger
Created at: Sunday 07th of February 2010 09:37:30 PM
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TRENCHLESS TECHNOLOGY

INTROD
UCTION
TT techniques include methods of pipeline & utility installations with minimum amount

of surface excavation
TT techniques are mainly divided into two main areas: TRENCHLESS CONSTRUCTION

METHODS(TCM) and TRENCHLESS RENEWAL METHODS(TRM)

TCM includes all methods for new utility & pipeline installations
TRM includes all methods of renewing, rehabilitating, or renovating an existing old

or host pipeline or utility system
Trenchless construction and ren ....etc

[:=Read Full Message Here=:]
Title: body of salt water
Page Link: body of salt water -
Posted By: seminar class
Created at: Wednesday 16th of February 2011 05:39:05 PM
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body of salt water; covering approximately one-fifth of the total ocean area of the world. It is the smallest, youngest, and physically most complex of the world's three major oceans. Stretching for more than 10,000 km, between the southern tips of Africa and Australia and, without its marginal seas, it has an area of about 73,440,000 sq km. The Indian Ocean's average depth is 3,890 m and, its deepest point, in the Sunda Deep of the Java Trench off the southern coast of Java, is 7,450 m.
The Indian Ocean is bounded by Ira ....etc

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Title: low k dielectric
Page Link: low k dielectric -
Posted By: electronics seminars
Created at: Tuesday 05th of January 2010 06:03:15 PM
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ABSTRACT

Low-k dielectrics are the very latest path breaking development in the field of Integrated Electronics. It is well on its way replacing the Al / SiO2 interconnects with the help of copper in CMOS fabrication of IC Chips. The CMOS technology has an in-built coupling capacitance which increases the time delay, thereby reducing associated processing speeds. This was compensated by reducing the thickness of the Al / SiO2 interconnects. There is a limit to the reduction in t ....etc

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Title: deep trench isolation process ppt
Page Link: deep trench isolation process ppt -
Posted By:
Created at: Monday 26th of November 2012 09:47:06 PM
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passive isolatinn by trench+expriment
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Title: trenchless technology full report
Page Link: trenchless technology full report -
Posted By: project report tiger
Created at: Sunday 07th of February 2010 09:37:30 PM
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TRENCHLESS TECHNOLOGY

INTROD
UCTION
TT techniques include methods of pipeline & utility installations with minimum amount

of surface excavation
TT techniques are mainly divided into two main areas: TRENCHLESS CONSTRUCTION

METHODS(TCM) and TRENCHLESS RENEWAL METHODS(TRM)

TCM includes all methods for new utility & pipeline installations
TRM includes all methods of renewing, rehabilitating, or renovating an existing old

or host pipeline or utility system
Trenchless construction and ren ....etc

[:=Read Full Message Here=:]
Title: deep trench isolation process ppt
Page Link: deep trench isolation process ppt -
Posted By:
Created at: Monday 26th of November 2012 09:47:06 PM
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Title: Deep trench isolation for 600V SOI power devices
Page Link: Deep trench isolation for 600V SOI power devices -
Posted By: seminar class
Created at: Wednesday 04th of May 2011 05:23:50 PM
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Abstract
This paper describes the realization andcharacterisation of DTI (deep trench isolation)on thick (60μm) SOI (Silicon On Insulator)wafers for domestic and automotiveapplications . In this aim, DTI processoptimisation and adaptation permits to identifythe key parameters in breakdown voltagecapability. The role of different parts ofelaborated DTI was found to demonstrate thepossibility of good results in breakdownvoltage – up to 600V.
1. Introduction
BESOI (Bond and Etch SOI) substrates arecommonly used to reali ....etc

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Title: The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasiv
Page Link: The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasiv -
Posted By: computer science crazy
Created at: Monday 29th of September 2008 01:12:34 PM
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Chemical Mechanical Planarization (CMP) is an important process in semiconductor chip fabrication. In the CMP process, excess material is removed and the surface is planarized by the action of chemical and mechanical forces. Shallow Trench Isolation (STI) has become a key technology for device isolation in recent times. In this method, a shallow trench is made on the silicon wafer between active devices, silicon dioxide is deposited over the trench as well as the active area and the excess silicon dioxide is removed by CMP. The oxide remaining ....etc

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Title: Field Trials of the Nereus Hybrid Underwater Robotic Vehicle in the Challenger
Page Link: Field Trials of the Nereus Hybrid Underwater Robotic Vehicle in the Challenger -
Posted By: seminar class
Created at: Tuesday 03rd of May 2011 07:33:41 PM
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Field Trials of the Nereus Hybrid Underwater Robotic Vehicle in the Challenger Deep of the Mariana Trench
Abstract—

This paper reports the results of sea trials of the
Nereus hybrid underwater robotic vehicle (HROV) conducted in
May and June 2009 in the Challenger Deep of the Mariana
Trench, where the vehicle successfully performed scientific observation
and sampling operations at hadal depths of 10,903 m.
The Nereus underwater vehicle is designed to perform scientific
survey and sampling to the full depth of the ocean — sig ....etc

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Title: Deep trench isolation for 600V SOI power devices
Page Link: Deep trench isolation for 600V SOI power devices -
Posted By: seminar class
Created at: Wednesday 04th of May 2011 05:23:50 PM
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Abstract
This paper describes the realization andcharacterisation of DTI (deep trench isolation)on thick (60μm) SOI (Silicon On Insulator)wafers for domestic and automotiveapplications . In this aim, DTI processoptimisation and adaptation permits to identifythe key parameters in breakdown voltagecapability. The role of different parts ofelaborated DTI was found to demonstrate thepossibility of good results in breakdownvoltage – up to 600V.
1. Introduction
BESOI (Bond and Etch SOI) substrates arecommonly used to reali ....etc

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Title: Free Space Optics FSO communications
Page Link: Free Space Optics FSO communications -
Posted By: computer science crazy
Created at: Sunday 20th of September 2009 06:25:14 PM
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Free Space Optics (FSO) communications, also called Optical Wireless (OW)
Bo Rong, Yi Qian, Member, IEEE, and Kejie Lu, Member, IEEE
Overview

Imagine a technology that offers unsurpassed reliability and

high-speed connectivity. A technology that can be installed globally is

easy to deploy, license-free and offers a fast, high ROI. That

technology is free-space optics (FSO).

Free Space Optics (FSO) communications, also called Optical

Wireless (OW) or Infrared Laser, refers to the transmission of

modulated visible or infrar ....etc

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Title: trench less technology
Page Link: trench less technology -
Posted By: vavuttan
Created at: Friday 09th of July 2010 09:04:50 AM
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respected sir,
i am Peter Mathew,doing B-tech,VJCET
i wish to take seminar on trench less technology.
trench less technology is an tunnelling process below the surface.
idont know its types,techniques,methods,its advantages n dis advantages,&techniques of trench less technologies used in India......
for seminar i need a report,n ppt ....etc

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