Torque Ripple Minimization in a Switched
Reluctance Drive by Neuro-fuzzy
Compensation

Simple power electronic drive circuit and fault tolerance of converter are specific advantages of SRM drives, but excessive torque ripple has limited its use to special applications. A new method for shaping the motor currents so that the ripple can be reduced is presented by this paper. Here, a compensating signal is added to the output of a PI
controller. This i ....etc

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Among the many environmental problems that offend and concern us perhaps none is as powerful and dramatic as water pollution. It is any undesirable change in physical, biological or chemical characteristics of water quality that adversely affects living organisms or makes water unsuitable for desirable use. Major sources that pollute water are domestic sewage and industrial effluents, acid rain etc. These are discharged into the rivers which in turn results in marine pollution.Marine pollution has been going on unnoticed for a long time by the ....etc

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Torque Ripple Minimization Of Switched Reluctance Machine
Using Genetic Algorithm

A major problem of Switched Reluctance Motors (SRM) is the Torque ripple, which causes undesirable acoustic noise and vibration. saliency of the stator and rotor is the main cause for this. This article describes an algorithm for reducing the torque dip on the basis of Genetic Algorithm (GA), thereby reducing the associated torque ripple.

Introduction
because of its simple mechanical structure and development ....etc

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Ripple-Carry Addition


Four-Bit Ripple-Carry Adder
• Four full adders connected in a ripple-carry chain form a four-bit
ripple-carry adder. ....etc

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Chemical Mechanical Planarization (CMP) is an important process in semiconductor chip fabrication. In the CMP process, excess material is removed and the surface is planarized by the action of chemical and mechanical forces. Shallow Trench Isolation (STI) has become a key technology for device isolation in recent times. In this method, a shallow trench is made on the silicon wafer between active devices, silicon dioxide is deposited over the trench as well as the active area and the excess silicon dioxide is removed by CMP. The oxide remaining ....etc

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