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Title: EUVL - EXTREME ULTRAVIOLET LITHOGRAPHY
Page Link: EUVL - EXTREME ULTRAVIOLET LITHOGRAPHY -
Posted By: seminar projects crazy
Created at: Wednesday 28th of January 2009 04:35:33 PM
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ABSTRACT
This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometers (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the high-volume manufacture of integrated circuits. It is widely anticipated that improvements in this technology will allow it to remain the sem ....etc

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Title: Immersion Lithography OPTICAL LITHOGRAPHY
Page Link: Immersion Lithography OPTICAL LITHOGRAPHY -
Posted By: computer science crazy
Created at: Thursday 17th of September 2009 03:23:04 AM
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Immersion Lithography

OPTICAL LITHOGRAPHY

The dramatic increase in performance and cost reduction in the electronics industry are attributable to innovations in the integrated circuit and packaging fabrication processes. ICs are made using Optical Lithography. The speed and performance of the chips, their associated packages, and, hence, the computer systems are dictated by the lithographic minimum printable size. Lithography, which replicates a pattern rapidly from chip to chip, wafer to wafer, or substrate to substrate, also determines ....etc

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Title: immersion lithography ppt
Page Link: immersion lithography ppt -
Posted By:
Created at: Wednesday 18th of July 2012 05:07:28 PM
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Title: seminar documentation of immersion lithography
Page Link: seminar documentation of immersion lithography -
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Created at: Monday 14th of January 2013 09:47:12 PM
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Title: extreme ultraviolet lithography
Page Link: extreme ultraviolet lithography -
Posted By: mechanical engineering
Created at: Monday 28th of December 2009 07:35:35 PM
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ABSTRACT

Silicon has been the heart of the world's technology boom for nearly half a century. Each year, manufacturers bring out the next great computer chip that boosts computing power and allows our Personal Computers to do more than we imagined just a decade ago. The current technology used to make microprocessors, deep ultraviolet lithography will begin to reach its limit around 2005. At that time, chipmakers will have to look to other technologies to cram more transistors onto silicon to create ....etc

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Title: Extreme Ultraviolet Lithography
Page Link: Extreme Ultraviolet Lithography -
Posted By: computer science crazy
Created at: Wednesday 08th of April 2009 02:34:17 AM
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Introduction

Silicon has been the heart of the world's technology boom for nearly half a century, but microprocessor manufacturers have all but squeezed the life out of it. The current technology used to make microprocessors will begin to reach its limit around 2005. At that time, chipmakers will have to look to other technologies to cram more transistors onto silicon to create more powerful chips. Many are already looking at extreme-ultraviolet lithography (EUVL) as a way to extend the life of silicon at least until the end of the decade. ....etc

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Title: IMMERSION LITHOGRAPHY
Page Link: IMMERSION LITHOGRAPHY -
Posted By: smart paper boy
Created at: Saturday 09th of July 2011 06:07:06 PM
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The growth of the semiconductor industry is driven by Moore’s law: “The complexity for minimum component cost has increased at a rate of roughly a factor of two per year”. Notice that Moore observed that not only was the number of components doubling yearly, but was doing so at minimum cost. One of the main factors driving the improvements in complexity and cost of ICs is improvements in optical lithography and the resulting ability to print ever smaller features. Recently optical lithography, the backbone of the industry for 45 years h ....etc

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Title: Immersion Lithography
Page Link: Immersion Lithography -
Posted By: computer science crazy
Created at: Monday 22nd of September 2008 02:52:00 AM
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The growth of the semiconductor industry is driven by Moore?s law: ?The complexity for minimum component cost has increased at a rate of roughly a factor of two per year?. Notice that Moore observed that not only was the number of components doubling yearly, but was doing so at minimum cost.

One of the main factors driving the improvements in complexity and cost of ICs is improvements in optical lithography and the resulting ability to print ever smaller features.

Recently optical lithography, the backbone of the industry for 45 years ha ....etc

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Title: Extreme Ultraviolet Lithography
Page Link: Extreme Ultraviolet Lithography -
Posted By: computer science crazy
Created at: Sunday 21st of September 2008 12:38:43 PM
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Introduction

Silicon has been the heart of the world's technology boom for nearly half a century, but microprocessor manufacturers have all but squeezed the life out of it. The current technology used to make microprocessors will begin to reach its limit around 2005. At that time, chipmakers will have to look to other technologies to cram more transistors onto silicon to create more powerful chips. Many are already looking at extreme-ultraviolet lithography (EUVL) as a way to extend the life of silicon at least until the end of the decade. ....etc

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Title: extreme ultraviolet lithography full report
Page Link: extreme ultraviolet lithography full report -
Posted By: project reporter
Created at: Monday 01st of February 2010 02:28:17 PM
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1. INTRODUCTION

Silicon has been the heart of the world's technology boom for nearly half a century, but microprocessor manufacturers have all but squeezed the life out of it. The current technology used to make microprocessors will begin to reach its limit around 2006. At that time, chipmakers will have to look to other technologies to cram more transistors onto silicon to create more powerful chips. Many are already looking at extreme-ultraviolet lithography (EUVL) as a way to extend the life of silicon at least un ....etc

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