The growth of the semiconductor industry is driven by Moore?s law: ?The complexity for minimum component cost has increased at a rate of roughly a factor of two per year?. Notice that Moore observed that not only was the number of components doubling yearly, but was doing so at minimum cost.

One of the main factors driving the improvements in complexity and cost of ICs is improvements in optical lithography and the resulting ability to print ever smaller features.

Recently optical lithography, the backbone of the industry for 45 years ha ....etc

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ABSTRACT
This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometers (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the high-volume manufacture of integrated circuits. It is widely anticipated that improvements in this technology will allow it to remain the sem ....etc

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Immersion Lithography

OPTICAL LITHOGRAPHY

The dramatic increase in performance and cost reduction in the electronics industry are attributable to innovations in the integrated circuit and packaging fabrication processes. ICs are made using Optical Lithography. The speed and performance of the chips, their associated packages, and, hence, the computer systems are dictated by the lithographic minimum printable size. Lithography, which replicates a pattern rapidly from chip to chip, wafer to wafer, or substrate to substrate, also determines ....etc

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Introduction

Silicon has been the heart of the world's technology boom for nearly half a century, but microprocessor manufacturers have all but squeezed the life out of it. The current technology used to make microprocessors will begin to reach its limit around 2005. At that time, chipmakers will have to look to other technologies to cram more transistors onto silicon to create more powerful chips. Many are already looking at extreme-ultraviolet lithography (EUVL) as a way to extend the life of silicon at least until the end of the decade. ....etc

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Introduction to Lithography for Nanometer VLSI Manufacturing


Optical Proximity Correction (OPC)
•Optical proximity correction (OPC) is a photolithography enhancement techniques commonly used to compensate the mask pattern for image errors due to diffraction or process effects.


Design for Manufacturability (DFM)
•A design methodologyincludes a set of techniquesto modify the design of ICs in order to improve:
–Functional yield, parametric ....etc

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