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Title: pulsed laser micro polishing seminars ppt
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Created at: Friday 27th of February 2015 01:43:46 PM
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Title: pulsed laser micro polishing seminars ppt
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Created at: Wednesday 25th of February 2015 06:37:51 PM
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Chemical Mechanical Planarization (CMP) is an important process in semiconductor chip fabrication. In the CMP process, excess material is removed and the surface is planarized by the action of chemical and mechanical forces. Shallow Trench Isolation (STI) has become a key technology for device isolation in recent times. In this method, a shallow trench is made on the silicon wafer between active devices, silicon dioxide is deposited over the trench as well as the active area and the excess silicon dioxide is removed by CMP. The oxide remaining ....etc

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Title: pulsed laser micro polishing ppt
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