Transparent and conductive ZnO:Al films deposited by large area reactive
magnetron sputtering
Abstract
A new coating technology has been developed for large area deposition of transparent and conductive ZnO:Al films. ReactiveAC magnetron sputtering from metallic Zn:Al has been performed at low substrate temperature below 200 8C using the newCleanMag technology of applied films based on moving magnets for layers with low defect density and with conventional reactiveAC magnetron sputtering using static magnets (Applied Films TwinMag). ....etc

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Effect of substrate temperature on the growth of ITO thin films
M. Nisha, S. Anusha, Aldrin Antony, R. Manoj, M.K. Jayaraj
*
Optoelectronics Device Laboratory, Department of Physics, Cochin University of Science and Technology,
Kochi 682 022, Kerala, India
Received 2 November 2004; received in revised form 20 February 2005; accepted 20 February 2005
Abstract
Indium tin oxide (ITO) thin films were deposited onto glass substrates by rf magnetron sputtering of ITO target and the
influence of substrate temperature on the properties of the f ....etc

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Presented by:
Professor Chaim N. Sukenik

Abstract

Reaction chemistry at ordered interfaces; patterning nanoscale assemblies;
monolayers as ultra-thin barrier layers on metals, alloys and polymer composites; surface modification to control biocompatibity; ceramic thin films.

For more details, visit
http://nanocenter.biu.ac.il/ppt/111.ppt
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