Nanopatterning
#1


Martin, Nogues, Liu, Vicent, Schuller, JMMM, 256, 449 (2003).


Nanopatterning

Lithography

I. Basic lithography processes
II. Types of lithography


Hard Bake

Stabilize the developed resist for subsequent processes
Can make removal very difficult
Remove residual solvent
Not necessary for lift-off
Temperature/time can change the profile



for more details, please visit
http://physics.ucdavis.edu/~kliu/Phy250/...raphy1.pdf

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