18-10-2010, 10:27 AM
Martin, Nogues, Liu, Vicent, Schuller, JMMM, 256, 449 (2003).
Nanopatterning
Lithography
I. Basic lithography processes
II. Types of lithography
Hard Bake
Stabilize the developed resist for subsequent processes
Can make removal very difficult
Remove residual solvent
Not necessary for lift-off
Temperature/time can change the profile
for more details, please visit
http://physics.ucdavis.edu/~kliu/Phy250/...raphy1.pdf