Laser micro fabrication technologies on RF MEMS

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INTRODUCTION



Radio Frequency Microelectromechanical Systems Switches (RF MEMS)
Lower insertion loss
High isolation
Greater linearity
Lower static power dissipation

RF MEMS Switch Structure


Substrate
Coplanar waveguide(CPW) signal line
Bridge
Electrode plate

Fabrication based on IC wet and dry etching technique


Fabrication Procedure


Oxidation of SiO2 and deposition of SiN on Si substrate
Formation of signal line and ground electrode
SiN/Ta2O5 double dielectric films on signal line
Vaporizing Al layer and wet etching
Polymide coating to achieve sacrificial layer



LASER FABRICATION TECHNOLOGY


Laser machining of complex surfaces
i. Direct mode
* Pulsed solid state lasers
* Focused laser spot scanned over work piece
ii. Mask projection mode
* Excimer lasers
* Imaging lens used to project a mask pattern